OPTIMAL
AutOmated Maskless Laser Litography Platform for First TIme Right Mixed ScALe Patterning

The OPTIMAL project aims to revolutionize the manufacturing of structures, known as masters, which are crucial for replication techniques in various fields such as optics, industry, and medical device fabrication. For the first time, it will integrate different laser lithography technologies, quality monitoring systems, and processes into a single platform. This integration will enable the development of structures with high depth, dimensions ranging from 100 nm to sub-mm, and 2D & 3D shapes on flat surfaces. The project combines parallel and serial patterning, eliminates the need for external treatments on samples, and increases speed and coverage area. Furthermore, the OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.
Grant agreement ID: 101057029
Starting date of the project: 01/10/2022
Duration: 48 months
Project Coordinator: JOANNEUM RESEARCH Forschungsgesellschaft mbH
Website: https://www.optimal-project.eu/
For additional information please contact optimal@joanneum.at
The OPTIMAL project receives funding from the European Union’s Horizon Europe research and innovation programme under Grant Agreement No. 101057029.

